Atlas X

IXRF Systems’ ATLAS SEMI microEDXRF spectrometer is the very latest micro/small spot energy dispersive X-ray fluorescence (EDXRF) spectrometer for semiconductor metrology. Designed to image and analyze wafers up to 300mm diameter, ATLAS leads the industry in virtually every major specification category from the largest chamber and the highest detector active area, to the longest mapping travel and smallest micro-spot.

Hardware specifications are only half of the ATLAS AdvantageTM. ATLAS’ Iridium Ultra software platform, developed with SEM-EDS elemental mapping and analytical functionality, is unsurpassed in it’s ability to provide elemental and phase mapping, line scans, critical dimensions (CD) as well as qualitative and quantitative elemental analyses of multi-layer thin film stacks. The functional, flexible, and feature-rich software suite guarantees unprecedented productivity. ATLAS SEMI is not just an instrument, it is the microXRF metrology tool that leads with innovation.

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X-ray source


  • 50 kV / 50 W / 1 mA Rh target (others available) X-ray tube
  • Filter wheel with up to 8 filters positioned before the focusing optic
  • Optional use of two X-ray tubes for different element ranges, targets, and spot sizes
  • Spot Size: >5 μm
SDD detectors for SEM
Optical kernel


  • Mix and match up to 4 Silicon Drift Detectors (SDD)
    • For increased precision and/or reduced acquisition times
  • 50mm2 to 150mm2 active area
    • Highest resolution to highest counting rate
  • Available resolutions: ≤130-145 eV resolution
  • Peltier cooling
Quad detectors
Atlas stage

High precision stages

  • Motorized XYZ
  • Speeds up to 300 mm/s
    • Map acquisitions at ≤ 1 ms/pixel
  • Accuracy < 1 µm
  • Custom adapters available
Liquids and powders

Sample types and conditions

  • Air, vacuum, and helium atmosphere
  • Vacuum ready in under one minute
  • Solids, liquids, powders and thin films
Atlas in the FAB

Chamber and geometry

  • Chamber size: 950 x 650 x 365 mm (37 x 26 x 14 inches)
  • Top-down perpendicular geometry from tube to sample
  • Mapping area: 400 x 300 mm under automatic control
  • Sample view: 3 sample positioning and analysis cameras
    • Samples may be positioned manually with the door open

Iridium Ultra mapping and analysis software

Semi Software

Acquisition and quantitation

  • One-click acquisition and automatic peak identification
  • Customizable identification, labeling, processing, and quantification
  • Scrolling periodic chart
  • Drag and drop overlay
  • Automatic overlap correction, sum/escape peak removal, background correction, and linear/non-linear deconvolution
  • Fundamental Parameters (FP) and Quantitative Match
  • Material classification database

Imaging and analysis

  • Multi-Point automated analysis directly from image
  • Morphological processing for rapid feature size measurements
  • Image stitching and montage
  • Segmentation and feature segregation
  • Particle analysis package including border removal, sorting, exclusion, and classification by composition

Mapping and linescans

  • Simultaneous acquisition of 35 elements
  • Stored spectral data for every pixel
  • Live spectrum display during acquisition
  • Single or multiple map acquisition from image
    • Overview or spot camera
  • Map stitching and montage
  • Extract spectra from map: point, area, freehand
  • Create linescan from map
  • Mouse-over view intensities and concentrations
  • Phase Analysis
  • Multi-compositional map display
    • Of element and compound ranges
  • Overlay linescans on image

Specialty and automation

  • Multilayer thin film and coatings analysis up to 8 layers
  • Serpentine continuous mapping (dual directional mapping)
  • ASTM E2926-13 Glass Analysis
  • Track, store, and recall all stage locations and images

Product features

  • Spot size down to 5 microns with anti-halo optic
  • SDD detector w/ active area up to 150mm2
  • Largest chamber volume for 300mm wafers
  • 50 kV / 50 W tube
  • Multi-point/multi-area automation & mapping
  • Air, vacuum, helium for solids, liquids, and powders



Elemental range:

Sodium (Na) through uranium (U)

Sample types:

Solids, liquids, particles, powders and thin films

Sample chamber size:

950 x 650 x 365 mm (37 x 26 x 14 inches)

Analysis atmosphere:

Air, vacuum or He(g) purge

Primary X-ray source:

50 W max power, 50 kV @ 1 mA

Optional secondary X-ray source:

4-12 W max power,  40-60 kV @ 0.4-1 mA

X-ray source optics:

Polycapillary or aperture collimation

X-ray source anode:

Rhodium (others optionally available)

X-ray source spot size:

≥5 to 1000 μm

X-ray source filters:

Up to 8

Primary X-ray source geometry:

Top-down beam (perpendicular to sample stage)


1 standard, optionally up to a maximum of 4

Detector types:

Silicon drift detector (SDD) standard (PIN-diode is optionally available)

Detector active area:

50 to 150 mm2

Sample stage type:

Motorized X,Y and Z (optional)

Sample stage travel:

600(W) x 300(D) x 150(H) mm

Mapping travel:

400(X) x 300(Y) mm

Mapping scan speed:

1-3 ms/pixel

Stage XY speed:

Up to 300 mm/s

Sample view:

3 cameras for sample positioning and analysis

Operating system:

SFF PC w/ Microsoft® Windows™ 10 OS

Analysis and control software:

Iridium Ultra: provides complete control of parameters, filters, cameras, optical microscopes, sample illumination and positioning, and measurement media

Quality and safety:

CE marked, RoHS, radiation < 0.5 μSv/h


1690(L) x 787(W) x 1630(H) mm (67 x 31 x 64 inches)


100-240 V, 1 phase, 50/60 Hz

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